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April 20, 2021

New Fab Expansion at Sony Semiconductor Manufacturing Corporation’s Nagasaki Technology Center

Sony Semiconductor Solutions Corporation

Atsugi, Japan — Sony Semiconductor Solutions Corporation today announced that, starting in April 2021, it has begun operations on the production lines at the new fab built on the premises of Nagasaki Technology Center (“Nagasaki TEC”), a production center owned by Sony Semiconductor Manufacturing Corporation. The new fab, dubbed “Fab 5,” will be utilized for the mass production of CMOS image sensors.

Nagasaki TEC serves as a production center for CMOS image sensors for smartphones, the main product line within Sony’s Imaging & Sensing Solutions business. Going forward, Sony Semiconductor Solutions plans to expand production facilities at Fab 5 in line with market trends, thereby further building out its CMOS image sensor production infrastructure to allow Sony to continue to deliver CMOS image sensors with superior image quality and high performance, mainly for application in the ever-advancing smartphone camera market.

Nagasaki Technology Center (The gray building pictured in the front left is Fab 5)

Sony Semiconductor Manufacturing Corporation
(1)Location 4000-1 Haramizu, Kikuyo-machi, Kikuchi-gun, Kumamoto, Japan
(2)Capital 100 million yen (Fully funded by Sony Semiconductor Solutions Corporation)
(3)Representative Terushi Shimizu, Representative Director and President
(4)Business Design, development, production and customer service for semiconductors
(5)Number of employees Approximately 9,800 (As of April 1, 2021, including temporary employees)
Sony Semiconductor Manufacturing Corporation, Nagasaki Technology Center
(1)Location 1883-43 Tsukuba-machi, Isahaya-shi, Nagasaki, Japan
(2)Established December 1987
(3)Site area Approximately 269,000 m²
(4)Number of employees Approximately 2,900 (As of April 1, 2021, including temporary employees)
(5)Products manufactured CMOS image sensors
Fab 5 Overview (as of April 2021)
(1)Total floor area Approximately 48,000 m²
(2)Clean room area 10,000 m² (5,000 m2 x 2 floors)
(3)Products manufactured CMOS image sensors
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